Arco Krijgsman
Arco Krijgsman obtained his Master's degree in Applied Physics from the University of Twente in 2001.
Since then, he has been involved in various roles in the development of high-tech optical systems. Starting in 2002, he was part of a start-up company working on a new type of excimer laser.
Since 2010, he has worked for ASML, where he has led various teams in key areas of the development of the EUV lithography system. He is currently head of public-private partnerships.
In addition to his role at ASML, Arco is a member of the Confederation of Netherlands Industry and Employers (VNO-NCW) expert committee on Technology & Innovation and a member of the EU public roadmap core team for electronic components and systems, the ECS-SRIA.
