Data-based Mechatronic Performance Optimization for Metrology Equipment

Optimizing Motion Controllers for Metrology Equipment

The project focuses on developing advanced control methodologies to optimize motion controllers in metrology equipment. This involves fundamental research into data-based optimization techniques such as extremum seeking control and perturb-and-observe methods. The goal is to enhance the performance of positioning stages, reducing settling time and improving throughput. This research will contribute to the development of more efficient and accurate metrology equipment, benefiting the semiconductor manufacturing industry.

Research and Development Activities

The project is divided into two main work packages, each with a strong fundamental research component. The first work package focuses on optimizing point-to-point motion of coupled positioning units. The second work package targets the optimization of raster scan motion of the scan head. Both packages will include experimental demonstrations to validate the research findings on industrial-scale setups.

Broader Impact and Intended Results

This project contributes to the Semiconductor Manufacturing Equipment Strategic Program and the National Technology Strategy. It strengthens the Netherlands' leadership in key enabling technologies like mechatronics, micro-electronics, and AI. The project aims to deliver a data-driven control framework with improved system accuracy and throughput, benefiting Dutch OEMs and the broader semiconductor industry. Additionally, it will strengthen the research position of the Netherlands in the semiconductor field, enhancing its global reputation for innovation and excellence.