OPTIMAX
Optimized multilayers for soft X-ray reflectance
The synthesis of layered structures with thicknesses in the nanometer and sub-nanometer range is of fundamental importance for electronics, micromechanics, and optics. In particular, X-ray multilayer structures are used in materials analysis, space research, synchrotrons, free electron lasers, as well as in medicine and biology. The new generation EUV lithography is entirely based on 13.5 nm multilayer mirrors.
In this project we will focus on the synthesis of ultra-short period multilayers for the so-called “water window” (2.3-4.4 nm) and shorter wavelengths, where controlling the layers at the atomic level is still a challenge. Monolayer-thick diffusion barriers will be applied, and the deposition energy will be tuned at individual stages of layer growth to optimize interactions at interfaces and maximize reflectivity - OPTIMAX.