Holland High Tech Holland High Tech
MINT

Mechanical Integrity of NanoTube structures

Free-standing carbon and boron-nitride nanotube (NT) membranes are the prospective candidates for extreme ultraviolet (EUV) pellicles to be used in the next generation EUV lithography machines. They can be made extremely thin, fracture-resilient, and resistant to detrimental effects of extreme environments (high temperature, free hydrogen, etc.).

Impact

However, the mechanical properties and chemical stability/inertness of NT pellicles are currently poorly understood. Our project is aimed at: 1) establishing a numerical simulation model that is capable to reliably predict the real pellicle’s mechanical properties and 2) developing strategies to extend the pellicle operational lifetime by improving the chemical inertness.

Facts & figures
  • Scheme: PPS-I Strategische Programma's
  • Programme: Semiconductor Manufacturing Equipment | 2024-2027
  • Total budgeted project costs: € 470.400,00
  • Project start date: 1 January 2025
  • Project end date: 31 December 2026
Project managers
Project consortium
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