ImSpec
Imaging Spectroscopy for Broadband EUV Source Size Characterization
Laser-produced tin plasmas produce extreme ultraviolet (EUV) radiation at 13.5-nm wavelength for EUV lithography. The industry requires ever more powerful and efficient EUV sources. New plasma source “recipes” will change the radiation emitted by the plasma, which must be understood.
We propose to continue a highly successful ARCNL/UT collaboration to develop and employ novel, compact imaging spectroscopy capabilities, building onto our invention that enabled creating a spectrally resolved 1D image over a wide wavelength range, as well as 2D images in a narrow wavelength band using multilayer mirrors. We will employ the new capabilities to optimize new laser-produced plasma sources for EUV light.