HiFi
High Flux hydrogen Illumination
This project by ASML and the University of Twente aims to push forward chip-making technology by developing technology for the next generation of Extreme Ultraviolet (EUV) lithography machines with increased source power for higher throughput (wafers per hour).
Higher powers increase the plasma load on coatings of optical components. Current lab-based test setups do not allow accelerated lifetime tests for hydrogen plasma. Magnetron based discharges should allow developing sources that expose samples to high flux (> 1 x 1016 ions/(cm2s)) hydrogen ions with energy < 10 eV.
This innovation will help enable EUV scanners to produce more powerful, efficient chips while supporting Dutch leadership in cutting-edge materials science and precision engineering.